التفاصيل البيبلوغرافية
| العنوان: |
Growth in ultrahigh vacuum and structural characterization of FeSi sub 2 on Si(111) |
| المساهمون: |
Grimaldi, M [Univ. di Catania (Italy)] |
| المصدر: |
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States); 9:4; Conference: 18. annual conference on physics and chemistry of semiconductor interfaces, Long Beach, CA (United States), 29 Jan - 1 Feb 1991 |
| وصف الملف: |
Medium: X; Size: Pages: 2433-2436 |
| URL الوصول: |
http://www.osti.gov/scitech/biblio/7116104 |
| قاعدة البيانات: |
SciTech Connect |