Patent
Efficient high-harmonic-generation-based EUV source driven by short wavelength light
| العنوان: | Efficient high-harmonic-generation-based EUV source driven by short wavelength light |
|---|---|
| Patent Number: | 8,704,198 |
| تاريخ النشر: | April 22, 2014 |
| Appl. No: | 12/966574 |
| Application Filed: | December 13, 2010 |
| مستخلص: | Extreme ultraviolet radiation is generated based on high-order harmonic generation. First, a driver pulse is generated from a drive laser. Second, the infrared driver pulse is passed through a second harmonic generator with an output wavelength in the range from 400 to 700 nm. Third, the pulse is then passed through a gas medium, which can be inside a resonant cavity, to generate a high-order harmonic in the form of extreme ultraviolet radiation. |
| Inventors: | Kaertner, Franz X. (Newton, MA, US); Falcao-Filho, Edilson L. (Recife, BR); Lai, Chien-Jen (Cambridge, MA, US); Hong, Kyung-Han (Lexington, MA, US); Fan, Tso Yee (Belmont, MA, US) |
| Assignees: | Massachusetts Institute of Technology (Cambridge, MA, US) |
| Claim: | 1. A method for efficient generation of extreme ultraviolet radiation based on high-order harmonic generation, comprising: generating an infrared driver pulse from a drive laser; passing the infrared driver pulse through a second harmonic generator with an output wavelength in a range from 400 to 700 nm; and then passing the pulse through a gas medium that comprises at least one gas selected from neon and helium inside a Bessel-Gauss resonator to generate a high-order harmonic in the form of extreme ultraviolet radiation. |
| Claim: | 2. The method of claim 1 , wherein the driver pulse has an energy in a range from 100 μJ to 100 mJ inside the resonant cavity. |
| Claim: | 3. The method of claim 1 , wherein the driver pulse has a repetition rate greater than 100 kHz. |
| Claim: | 4. The method of claim 1 , wherein the driver pulse has an energy in a range from 1-10 μj before entering the resonant cavity. |
| Claim: | 5. The method of claim 1 , wherein the driver pulse has a repetition rate in a range from 50-100 MHz. |
| Claim: | 6. The method of claim 1 , wherein the wavelength of the driver pulse is about 1 μm, and wherein the second harmonic generator produces a wavelength of about 500 nm. |
| Claim: | 7. The method of claim 6 , wherein the generated high-order harmonic has a wavelength of about 13.5 nm. |
| Claim: | 8. The method of claim 1 , wherein the extreme ultraviolet radiation is spatially and temporally fully coherent. |
| Claim: | 9. The method of claim 1 , further comprising directing a pattern of the extreme ultraviolet radiation onto a photosensitive surface to perform lithography. |
| Claim: | 10. The method of claim 1 , wherein the wavelength of the driver pulse is about 1300 nm delivered from a Cr:Forsterite laser, and wherein the second harmonic generator produces a wavelength of about 650 nm. |
| Claim: | 11. An efficient high-harmonic-generation-based extreme ultraviolet radiation source driven by short wavelength light comprising: a laser configured to emit optical pulses along a path; a second harmonic generator positioned in the path of the optical pulses with output wavelength in a range from 400 to 700 nm; and an extreme ultraviolet radiation generator including a Bessel-Gauss cavity containing a gas medium comprising at least one gas selected from neon and helium positioned in the path of the optical pulses on an opposite side of the second harmonic generator from the laser. |
| Claim: | 12. The extreme ultraviolet radiation source of claim 11 , wherein the laser is selected from a titanium:sapphire laser, an ytterbium-based solid-state or fiber laser, and a Cr:Forsterite laser. |
| Claim: | 13. The extreme ultraviolet radiation source of claim 11 , wherein the second harmonic generator includes β-BaB 2 O 4 . |
| Current U.S. Class: | 250/504R |
| Patent References Cited: | 5963359 October 1999 Shinozaki et al. 6968038 November 2005 Nam et al. 7391850 June 2008 Kaertner et al. 2002/0172235 November 2002 Chang et al. 2006/0268949 November 2006 Gohle et al. 2008/0030876 February 2008 Kataoka et al. 2008/0069171 March 2008 Rocca et al. 2008/0137696 June 2008 Zhang et al. 2010/0207034 August 2010 Moiseyev et al. 2011/0013653 January 2011 Krausz et al. |
| Other References: | Kim et al. ‘Highly Efficient High-Harmonic Generation in an Orthogonally Polarized Two Color Laser Field’ Jun. 21, 2005, Physical Review Letters, vol. 94, p. 293901. cited by examiner Gutierrez-Vega et a;. ‘Bessel-Gauss Resonator with Spherical Output Mirror Geometrical and Wave-Optics Analysis’ Nov. 2003, Jo. Opt. Soc. Am. A, vol. 20, No. 11, p. 2113-2122. cited by examiner Caron et al. ‘Phase Matching and Harmonic Generation in Bessel-Gauss Beams’ Mar. 1998, J. Opt. Soc. Am. B, vol. 15, No. 3, p. 1096-1106. cited by examiner Korean Intellectual Property Office, International Search Report and Written Opinion for PCT/US2010/060101 (PCT application corresponding to the present US application) (Nov. 14, 2011). cited by applicant Moll, Kevin D., et al., “Output coupling methods for cavity-based high-harmonic generation”, Optics Express, vol. 14, No. 18 (Sep. 4, 2006), pp. 8189-8197. cited by applicant Gohle, Christoph, et al., “A frequency comb in the extreme ultraviolet”, Nature, vol. 436 (Jul. 14, 2005), pp. 234-237. cited by applicant Falcao-Filho, Edilson L., et al., “Scaling of high harmonic generation efficiencies with 400-nm and 800-nm driver pulses”, Conference on Lasers and Electro-Optics (CLEO) 2010 (May 16, 2010), pp. 1-3. cited by applicant Yost, D. C., et al., “Efficient output coupling of intracavity high-harmonic generation”, Optics Letters, vol. 33, No. 10 (May 15, 2008), pp. 1099-1101. cited by applicant Jones, R. J., et al., “Phase-Coherent Frequency Combs in the Vacuum Ultraviolet via High-Harmonic Generation inside a Femtosecond Enhancement Cavity”, Physical review letters (PRL 94, 193201) (May 20, 2005), pp. 1-4. cited by applicant Hong, Kyung-Han, et al., “High-energy, picosecond, cryogenic Yb:YAG chirped-pulse amplifier at kHz repetition rates for OPCPA pumping”, Conference on Lasers and Electro-Optics (CLEO) 2010 (May 21, 2010), pp. 1-2. cited by applicant Huang, Shu-Wei, et al., “Ultrabroadband Optical Parametric Chirped Pulse Amplifier System for Single-Cycle Waveform Synthesis”, Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS) 2010 (May 21, 2010), pp. 1-2. cited by applicant Gkortsas, Vasileios-Marios, et al., “High Efficiency High Harmonic Generation Based EUV Sources”, Optical Society of America (2009), pp. 1-2. cited by applicant Putnam, William P., et al., “High-Intensity Bessel-Gauss Beam Enhancement Cavities”, Conference on Lasers and Electro-Optics, OSA Technical Digest (CD) (Optical Society of America) 2010 (May 16, 2010), pp. 1-2. cited by applicant |
| Assistant Examiner: | Osenbaugh-Stewart, Eliza |
| Primary Examiner: | Logie, Michael |
| Attorney, Agent or Firm: | Modern Times Legal Sayre, Robert J. |
| رقم الانضمام: | edspgr.08704198 |
| قاعدة البيانات: | USPTO Patent Grants |
| الوصف غير متاح. |