Patent
Process for producing an optical recording medium with several stages and medium obtained thereby
| العنوان: | Process for producing an optical recording medium with several stages and medium obtained thereby |
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| Patent Number: | 7,909,957 |
| تاريخ النشر: | March 22, 2011 |
| Appl. No: | 11/597355 |
| Application Filed: | May 17, 2005 |
| مستخلص: | The recording medium comprises at least a first (L1) and a second (L2) micro-structured stage assembled by an adhesive layer (4) and arranged between micro-structured bottom (2) and top substrates. A polymerizable layer forming the adhesive layer (4) is deposited on the first stage (L1). Then a micro-structured transparent matrix (5) is provisionally placed on the adhesive layer (4) so as to micro-structure the adhesive layer (4). Polymerization of the adhesive (4) is performed by exposure, through the matrix (5), with a polymerization light. Then the matrix (5) is removed and the second stage (L2) is deposited on the micro-structured adhesive layer (4). Then an additional adhesive layer (9) is deposited on the second stage (L2) and the micro-structured matrix (5) is definitively placed on the additional adhesive layer (9) so as to form the top substrate. |
| Inventors: | Raby, Jacques (Grenoble, FR); Fargeix, Alain (Meylan, FR); Plissonnier, Marc (Eybens, FR); Ruty, Marine (Echirolles, FR) |
| Assignees: | Commissariat A l'Energie Atomique (Paris, FR), MPO International (Averton, FR) |
| Claim: | 1. Process for producing a recording medium comprising at least a first and a second micro-structured stage assembled by an adhesive layer and arranged between micro-structured bottom and top substrates, the process comprising: deposition on the first stage of a polymerizable layer forming the adhesive layer, provisional placing on the adhesive layer of a single micro-structured matrix, the single micro-structured matrix being transparent to a light designed to perform polymerization of the adhesive layer, so as to micro-structure the adhesive layer, polymerization of the adhesive by exposure, through the single micro-structured matrix, with a polymerization light, removal of the single micro-structured matrix, deposition of the second stage on the micro-structured adhesive layer, deposition of an additional adhesive layer on the second stage, and final placing of the single micro-structured matrix on the additional adhesive layer so as to form the top substrate, wherein the process further comprises: a surface treatment of the single micro-structured matrix enabling at least a part of a surface of the single micro-structured matrix to be made anti-adhesive, the surface treatment of the single micro-structured matrix being performed before the provisional placing on the adhesive layer of the single micro-structured matrix, and a neutralization step of the surface treatment of the single micro-structured matrix before the final placing of the single micro-structured matrix on the additional adhesive layer, the neutralization step of the surface treatment of the single micro-structured matrix being performed by application of an oxidizing plasma in a vacuum. |
| Claim: | 2. Process according to claim 1 , wherein the single micro-structured matrix comprises a micro-structured face and an opposite flat face. |
| Claim: | 3. Process according to claim 2 , wherein final placing of the single micro-structured matrix is performed by bringing the flat face into contact with the additional adhesive layer. |
| Claim: | 4. Process according to claim 2 , wherein final placing of the single micro-structured matrix is performed by bringing the micro-structured face into contact with the additional adhesive layer. |
| Claim: | 5. Process according to claim 1 , wherein the single micro-structured matrix and the bottom substrate are made of the same material. |
| Claim: | 6. Process according to claim 1 , further comprising: before final placing of the single micro-structured matrix, provisional placing of the single micro-structured matrix on the additional adhesive layer deposited on the second stage so as to micro-structure the additional adhesive layer, polymerization of the additional adhesive layer by exposure, through the single micro-structured matrix , with a polymerization light, removal of the micro-structured matrix, deposition of an additional stage on the micro-structured additional adhesive layer, and deposition of another additional adhesive layer on the additional stage. |
| Claim: | 7. Process according to claim 1 , wherein the surface treatment comprises deposition of an anti-adhesive thin film. |
| Claim: | 8. Process according to claim 1 , wherein the surface treatment enables the surface of the single micro-structured matrix to be made hydrophobic. |
| Claim: | 9. Process according to claim 1 , further comprising a surface activation step of the micro-structured adhesive layer, performed by a means chosen from among oxidizing plasmas in a vacuum and irradiations by ultraviolet light in ozone at atmospheric pressure. |
| Claim: | 10. Process according to claim 1 , wherein the first and second stages each consist of an active layer; and a semi-reflecting layer deposited on the active layer, wherein the adhesive layer is deposited on the semi-reflecting layer of the first stage, and the additional adhesive layer is deposited on the semi-reflecting layer of the second stage. |
| Claim: | 11. Process for producing a recording medium comprising at least a first and a second micro-structured stage assembled by an adhesive layer and arranged between micro-structured bottom and top substrates, the process comprising: deposition on the first stage of a polymerizable layer forming the adhesive layer, provisional placing on the adhesive layer of a single micro-structured matrix, the single micro-structured matrix being transparent to a light designed to perform polymerization of the adhesive layer, so as to micro-structure the adhesive layer, polymerization of the adhesive by exposure, through the single micro-structured matrix, with a polymerization light, removal of the single micro-structured matrix, deposition of the second stage on the micro-structured adhesive layer, deposition of an additional adhesive layer on the second stage, and final placing of the single micro-structured matrix on the additional adhesive layer so as to form the top substrate, wherein the process further comprises: a surface treatment of the single micro-structured matrix enabling at least a part of a surface of the single micro-structured matrix to be made anti-adhesive, the surface treatment of the single micro-structured matrix being performed before the provisional placing on the adhesive layer of the single micro-structured matrix, and a neutralization step of the surface treatment of the single micro-structured matrix before the final placing of the single micro-structured matrix on the additional adhesive layer, the neutralization step of the surface treatment of the single micro-structured matrix being performed by irradiations by ultraviolet light in ozone at atmospheric pressure. |
| Current U.S. Class: | 1562/733 |
| Patent References Cited: | 4716063 December 1987 Uehara et al. 5126996 June 1992 Iida et al. 6500511 December 2002 Ooki et al. 6599385 July 2003 Liao et al. 2003/0075434 April 2003 Voser et al. 2003/0098119 May 2003 Yang et al. 2003/0179693 September 2003 Ootera 2004/0219326 November 2004 Komaki et al. 0 368 442 May 1990 05143981 June 1993 11291260 October 1999 WO 03/032306 April 2003 |
| Assistant Examiner: | McNally, Daniel |
| Primary Examiner: | Crispino, Richard |
| Attorney, Agent or Firm: | Oliff & Berridge, PLC |
| رقم الانضمام: | edspgr.07909957 |
| قاعدة البيانات: | USPTO Patent Grants |
| الوصف غير متاح. |