Patent
Method for manufacturing colloidal crystals via confined convective assembly
| العنوان: | Method for manufacturing colloidal crystals via confined convective assembly |
|---|---|
| Patent Number: | 7,520,933 |
| تاريخ النشر: | April 21, 2009 |
| Appl. No: | 11/512413 |
| Application Filed: | August 30, 2006 |
| مستخلص: | Disclosed is a method of manufacturing colloidal crystals using a confined convective assembly, more particularly, to a method for manufacturing two-dimensional and/or three dimensional colloidal crystals on a substrate by infusing colloidal suspension between two substrates and self-assembling colloidal particles by capillary action. The present invention can control a convective flow moving the colloidal particles to a meniscus generated by removing the solvent of the colloidal suspension. It is possible to manufacture face-to-face two-dimensional colloidal crystals and/or three-dimensional colloidal crystals within a short time using various sizes of colloidal particles through the control of the convective flow of colloidal particles, which are not easily achieved in the existing method. The present invention can use two-dimensional colloidal crystals and/or three-dimensional colloidal crystals manufactured using the confined convective assembly method in the various fields such as in biosensors and devices, information storing medium, display devices and optical devices. |
| Inventors: | Park, O-Ok (Seoul, KR); Kim, Mun-Ho (Gyeongsangbuk-Do, KR); Im, Sang-Hyuk (Gyeongsangbuk-Do, KR) |
| Assignees: | Korea Advanced Institute of Science and Technology (Daejeon, KR) |
| Claim: | 1. A method of manufacturing a colloidal crystal, the method comprising: infusing a colloidal suspension comprising colloidal particles and a solvent in a fine space between two substrates; removing the solvent in the colloidal suspension and moving one of the substrates to form a meniscus in the fine space between two substrates; and self-assembling the colloidal particles by capillary action generated due to the removal of the solvent of the colloidal suspension in the meniscus to form a colloidal crystal on one of the substrates. |
| Claim: | 2. The method of claim 1 , wherein at least one of the substrates is selected from the group consisting of a glass substrate, a silicon substrate, an aluminum substrate, a silica substrate, a gold substrate, a polystyrene substrate, a polyester substrate, a polydimethylsiloxane (PDMS) substrate, and a substrate including colloidal crystals. |
| Claim: | 3. The method of claim 1 , wherein the substrate on which a colloidal crystal is formed can obtain multilayered colloidal crystals by applying a substrate including colloidal crystals formed from at least one selected from the group consisting of high molecular particles, metal particles, and inorganic particles. |
| Claim: | 4. The method of claim 1 , wherein the fine space between the two substrates has a thickness of 10-100 μm. |
| Claim: | 5. The method of claim 1 , wherein the colloidal suspension comprises at least one colloidal particle selected from the group consisting of a high molecular particle, inorganic particle, and metal particle. |
| Claim: | 6. The method of claim 1 , wherein the colloidal particles of the colloidal suspension have a diameter of 0.01-10 μm. |
| Claim: | 7. The method of claim 1 , wherein the solvent in the colloidal suspension is at least one selected from the group consisting of water, alcohol having 1-10 carbons, aliphatic solutizer, and aromatic solutizer. |
| Claim: | 8. The method of claim 1 , wherein the concentration of the colloidal particle in the colloidal suspension is 0.1-20% (w/v). |
| Claim: | 9. The method of claim 1 , wherein the moving substrate moves at a speed of 1-1000 μm/s. |
| Claim: | 10. The method of claim 1 , wherein the solvent in the colloidal suspension is removed by (a) supplying the colloidal suspension with warm air to evaporate the solvent in the colloidal suspension, (b) supplying the colloidal suspension with high temperature vapors to evaporate the solvent in the colloidal suspension, (c) evaporating the solvent in the colloidal suspension using a heating equipment, or (d) putting equipment required for manufacturing a colloid including a substrate in a chamber wherein temperature and humidity are controlled. |
| Claim: | 11. The method of claim 1 , further comprising filling in the pores of self-assembled colloid particles with at least one of semiconductor, metal, metal oxide, organic or organic derivatives. |
| Claim: | 12. The method of claim 5 , wherein the high molecular particle is at least one selected from the group consisting of polystyrene, polymethylmethacrylate, polyacrylate, polyalphamethylstyrene, polyphenylmethacrylate, polydiphenylmethacrylate, polycyclohexylmethacrylate, styrene-acrylonitrile (SAN) copolymer and styrene-methylmethacrylate copolymer. |
| Claim: | 13. The method of claim 5 , wherein the metal particle is at least one selected from the group consisting of gold, silver, aluminum, platinum, titanium, cadmium, and iron. |
| Claim: | 14. The method of claim 5 , wherein the inorganic particle is at least one selected from the group consisting of SiO 2 , TiO 2 , ZrO 2 , NiO, and SnO 2 . |
| Claim: | 15. The method of claim 11 , wherein the semiconductor is at least one selected from Si, CdS, CdSe, GaAs, GaAlAs, ZnS, and Ge. |
| Claim: | 16. The method of claim 11 , wherein the metal is at least one selected from the group consisting of gold, silver, aluminum, platinum, titanium, cadmium, and iron. |
| Claim: | 17. The method of claim 11 , wherein the metal oxide is at least one selected from the group consisting of aluminum oxide, iron oxide, zinc oxide, magnesium oxide, and antimony oxide. |
| Claim: | 18. The method of claim 11 , wherein the organic or organic derivative is at least one selected from the group consisting of poly(para-phenylene vinylene), polythiophene, poly(para-phenylene), polyquinoline, polypyrrole, polyacetylene, polyfluorenes, polydimethylsiloxane (PDMS), and polyurethane. |
| Current U.S. Class: | 117/68 |
| Patent References Cited: | 2006/0120683 June 2006 Kamp et al. |
| Other References: | West et al., Colloidal particles at a nematic-isotropic interface: Effects of confinement, Eur. Phys. J. E 20 2006 pp. 237-242. cited by examiner Dimitrov, A.S. and Nagayama, K., “Continuous Convective Assembling of Fine Particles into Two-Dimensional Arrays on Solid Surfaces,” Langmuir 12:1303-1311, American Chemical Society (1996). cited by other Van Duffel, B., et al., “Langmuir-Blodgett deposition and optical diffraction of two-dimensional opal,” J. Mater. Chem. 11:3333-3336, RSC Publishing (2001). cited by other Haynes, C.L. and Van Duyne, R.P., “Nanosphere Lithography: A Versatile Nanofabrication Tool for Studies of Size-Dependent Nanoparticle Optics,” J. Phys. Chem. 105:5599-5611, American Chemical Society (2001). cited by other Jiang, P., et al., “Single-Crystal Colloidal Multilayers of Controlled Thickness,” Chem. Mater. 11:2132-2140, American Chemical Society (1999). cited by other Míguez, H., et al., “Control of the Photonic Crystal Properties of fcc-Packed Submicrometer SiO2 Spheres by Sintering,” Adv. Mater. 10:480-483, Wiley-VCH Verlag GmbH & Co. KGaA (1998). cited by other Rogach, A.L., et al., “Electrophoretic Deposition of Latex-Based 3D Colloidal Photonic Crystals: A Technique for Rapid Production of High-Quality Opals,” Chem. Mater. 12:2721-2726, American Chemical Society (2000). cited by other |
| Primary Examiner: | Kunemund, Robert M |
| Attorney, Agent or Firm: | Sterne, Kessler, Goldstein & Fox P.L.L.C. |
| رقم الانضمام: | edspgr.07520933 |
| قاعدة البيانات: | USPTO Patent Grants |
| الوصف غير متاح. |