التفاصيل البيبلوغرافية
| العنوان: |
Deep trench liner removal process |
| Document Number: |
20110108517 |
| تاريخ النشر: |
May 12, 2011 |
| Appl. No: |
12/614496 |
| Application Filed: |
November 09, 2009 |
| مستخلص: |
A liner removal process is described, wherein an excess portion of a conformal liner formed in a trench is substantially removed while reducing or minimizing damage to a bulk fill material in the trench. |
| Inventors: |
LUONG, Vinh (Albany, NY, US); KO, Akiteru (Schenectady, NY, US) |
| Assignees: |
TOKYO ELECTRON LIMITED (Tokyo, JP) |
| Claim: |
1. A liner removal process, comprising: forming a trench in a substrate; depositing a conformal liner within said trench; filling said trench with a bulk fill material; and selectively removing an excess portion of said conformal liner by alternatingly forming a protective layer on an exposed surface of said bulk fill material and etching said conformal liner. |
| Claim: |
2. The method of claim 1, wherein said bulk fill material contains polycrystalline silicon. |
| Claim: |
3. The method of claim 1, wherein said conformal liner comprises a high dielectric constant (high-k) layer. |
| Claim: |
4. The method of claim 1, wherein said conformal liner contains hafnium. |
| Claim: |
5. The method of claim 1, wherein said forming said protective layer comprises depositing said protective layer on said exposed surface of said bulk fill material, or growing said protective layer on said exposed surface of said bulk fill material, or both depositing and growing said protective layer on said exposed surface of said bulk fill material. |
| Claim: |
6. The method of claim 1, wherein said forming said protective layer comprises oxidizing said exposed surface of said bulk fill material. |
| Claim: |
7. The method of claim 1, wherein said forming said protective layer comprises exposing said substrate to an oxygen-containing gas selected from the group consisting of radical, O2, ozone, CO, CO2, NO, N2O, or NO2. |
| Claim: |
8. The method of claim 1, wherein said forming said protective layer comprises exposing said substrate to a non-plasma gaseous environment. |
| Claim: |
9. The method of claim 1, wherein said forming said protective layer comprises exposing said substrate to plasma. |
| Claim: |
10. The method of claim 1, wherein said forming said protective layer comprises exposing said substrate to an ion beam or a gas cluster ion beam. |
| Claim: |
11. The method of claim 1, wherein said forming said protective layer comprises depositing said protective layer on said substrate using a vapor deposition process. |
| Claim: |
12. The method of claim 1, wherein said etching said conformal liner comprises performing a wet etching process, or a dry etching process, or both. |
| Claim: |
13. The method of claim 1, wherein said etching said conformal liner comprises performing a plasma etching process using a process gas having a halogen-containing gas and an optional noble gas. |
| Claim: |
14. The method of claim 13, wherein said halogen-containing gas is selected from the group consisting of HBr, Cl2, or BCl3. |
| Claim: |
15. The method of claim 13, wherein said process gas further comprises a hydrocarbon gas. |
| Claim: |
16. The method of claim 15, wherein said hydrocarbon gas is selected from the group consisting of C2H4, CH4, C2H2, C2H6, C3H4, C3H6, C3H8, C4H6, C4H8, C4H10, C5H8, C5H10, C6H6, C6H10, and C6H12. |
| Claim: |
17. The method of claim 1, wherein said forming said protective layer precedes said etching said conformal liner, and wherein said etching is performed for a duration of time sufficient to substantially consume said protective layer. |
| Claim: |
18. A liner removal process, comprising: forming a trench in a substrate; depositing a conformal high-k liner within said trench; filling said trench with a polysilicon layer; and selectively removing an excess portion of said conformal high-k liner by performing the following: oxidizing an exposed surface of said polysilicon layer in said trench by exposing said exposed surface to an oxygen-containing plasma, following said oxidizing, etching said conformal high-k liner using plasma formed of a process gas having a halogen-containing gas, and repeating said oxidizing and said etching until said excess portion of said conformal high-k liner is substantially removed. |
| Claim: |
19. The method of claim 18, wherein said conformal high-k layer contains hafnium, and said process gas comprises BCl3 and a hydrocarbon gas. |
| Claim: |
20. The method of claim 18, wherein an etch selectivity for said selectively removing said excess portion of said conformal high-k liner exceeds about 30-to-1, said etch selectivity representing a ratio of an etch rate of said conformal high-k liner to an etch rate of said polysilicon layer. |
| Current U.S. Class: |
216/6 |
| Current International Class: |
23 |
| رقم الانضمام: |
edspap.20110108517 |
| قاعدة البيانات: |
USPTO Patent Applications |