FABRICATION OF ENCLOSED NANOCHANNELS USING SILICA NANOPARTICLES

التفاصيل البيبلوغرافية
العنوان: FABRICATION OF ENCLOSED NANOCHANNELS USING SILICA NANOPARTICLES
Document Number: 20110011794
تاريخ النشر: January 20, 2011
Appl. No: 12/892427
Application Filed: September 28, 2010
مستخلص: In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.
Inventors: Brueck, Steven R. J. (Albuquerque, NM, US); Xia, Deying (Albuquerque, NM, US)
Claim: 1. A nanochannel device for selectively separating components of a fluid comprising: at least one first nanochannel having a first opening; at least one second nanochannel with a second opening, wherein the first opening is in a direction different from the first opening; and at least one porous sidewall having a plurality of pores between the first and the second nanochannel, wherein the first nanochannel, the second nanochannel, and the at least one porous sidewall are disposed such that the fluid enters through the first opening of the first nanochannel, percolates through the plurality of pores of the porous sidewall and exits through the second opening of the second nanochannel.
Claim: 2. The nanochannel device of claim 2, further comprising functionalized silica nanoparticles to selectively transport one component of the fluid.
Claim: 3. A method of diagnosing nanochannel formation comprising: depositing a drop of a suspension comprising silica nanoparticles on a patterned surface; determining that a nanochannel is not completely formed if the suspension of silica nanoparticles forms an elongated drop along a direction of the pattern; and determining that a top of the nanochannel is formed if the suspension of silica nanoparticles shows wetting.
Current U.S. Class: 21050/023
Current International Class: 01; 05
رقم الانضمام: edspap.20110011794
قاعدة البيانات: USPTO Patent Applications