Electronic Resource
Growth dynamics of nanocolumnar thin films deposited by magnetron sputtering at oblique angles
| العنوان: | Growth dynamics of nanocolumnar thin films deposited by magnetron sputtering at oblique angles |
|---|---|
| المؤلفون: | Universidad de Sevilla. Departamento de Física Aplicada I, Universidad de Sevilla. Departamento de Física Atómica, Molecular y Nuclear, Universidad de Sevilla. FQM196: Nanotecnología en Superficies y Plasma, Universidad de Sevilla. RNM138: Física Nuclear Aplicada, MCIN/AEI/10.13039/ 501100011033 PID2020-114270RA-I00, MCIN/AEI/10.13039/ 501100011033 PID2021-126524NB-I00, MCIN/AEI/10.13039/ 501100011033 PID2021-123879OB-C21, MCIN/AEI/10.13039/ 501100011033 PID2020-112620GB-I00, MCIN/AEI/10.13039/501100011033 TED2021-130124A-I00, MCIN/AEI/10.13039/501100011033 and the European Union NextGeneration EU /PRTR project US-1380977, MCIN/AEI/10.13039/501100011033 and the European Union NextGeneration EU /PRTR project US-1381045, FEDER and Consejería de Transformación Económica, Industria, Conocimiento y Universidades de la Junta de Andalucía P18-RT-3480, H2020-EU.1.2.1-FET OPEN program Grant 899352, Álvarez Molina, Rafael, García Valenzuela, Aurelio, Regodón Harkness, Guillermo Fernando, Ferrer Fernández, Francisco Javier, Rico, Victor, García-Martín, José Miguel, González-Elipe, Agustín R., Palmero Acebedo, Alberto |
| بيانات النشر: | IOP Publishing Lt. 2024 |
| نوع الوثيقة: | Electronic Resource |
| مستخلص: | The morphology of numerous nanocolumnar thin films deposited by the magnetron sputtering technique at oblique geometries and at relatively low temperatures has been analyzed for materials as different as Au, Pt, Ti, Cr, TiO₂, Al, HfN, Mo, V, WO₃ and W. Despite similar deposition conditions, two characteristic nanostructures have been identified depending on the material: a first one defined by highly tilted and symmetric nanocolumnar structures with a relatively high film density, and a second one characterized by rather vertical and asymmetric nanocolumns, with a much lower film density. With the help of a model, the two characteristic nanostructures have been linked to different growth dynamics and, specifically, to different surface relaxation mechanisms upon the incorporation of gaseous species with kinetic energies above the surface binding energy. Moreover, in the case of Ti, a smooth structural transition between the two types of growths has been found when varying the value of the power used to maintain the plasma discharge. Based on these results, the existence of different surface relaxation mechanisms is proposed, which quantitatively explains numerous experimental results under the same conceptual framework. |
| مصطلحات الفهرس: | Magnetron sputtering, Oblique angle deposition, Nanocolumns, Hyperthermal processes, info:eu-repo/semantics/article |
| URL: | PID2020-114270RA-I00 PID2021-126524NB-I00 PID2021-123879OB-C21 PID2020-112620GB-I00 TED2021-130124A-I00 US-1380977 US-1381045 P18-RT-3480 EU H2020 899352 |
| الاتاحة: | Open access content. Open access content http://creativecommons.org/licenses/by-nc-nd/4.0 info:eu-repo/semantics/openAccess Attribution-NonCommercial-NoDerivatives 4.0 Internacional |
| ملاحظة: | English |
| Other Numbers: | SUE oai:idus.us.es:11441/152890 0957-4484 1361-6528 10.1088/1361-6528/ad113d 1423461520 |
| المصدر المساهم: | UNIV DE SEVILLA From OAIster®, provided by the OCLC Cooperative. |
| رقم الانضمام: | edsoai.on1423461520 |
| قاعدة البيانات: | OAIster |
| الوصف غير متاح. |