Electronic Resource

Stoichlometry control over a wide composition range of sputtered CuGa_(x)In_(1-x)Se_(2)

التفاصيل البيبلوغرافية
العنوان: Stoichlometry control over a wide composition range of sputtered CuGa_(x)In_(1-x)Se_(2)
المؤلفون: Mártil de la Plaza, Ignacio, González Díaz, Germán, Hernández Rojas, J.L., Lucía Mulas, María Luisa, Santamaría Sánchez-Barriga, Jacobo, Sánchez Quesada, Francisco
بيانات النشر: American Institute of Physics 2023-06-20T19:08:41Z 2023-06-20T19:08:41Z 1994-03-07
نوع الوثيقة: Electronic Resource
مستخلص: © American Institute of Physics. This work was partially supported by the European Communities under Contract JOU2-CT92-0141.
Films of CuGaxIn(1-x)Se2 (CGIS) have been grown by rf sputtering from stoichiometric single targets with different Ga/In ratios. Adjusting growth temperature and argon pressure we are able to deposit films with a wide range of Cu contents: From CGIS Cu-poor (16 at. %) to Cu2Se. Reevaporation of (Ga,In)2Se3 binaries is observed when substrate temperature is increased at a constant argon pressure (20 mTorr). An increase in Ar pressure from 5 to 150 mTorr at a growth temperature of 450-degrees-C, produces a decrease in Cu atomic percentage from 24% to 16% due to a preferential diffusion of Cu sputtered atoms in the plasma. The relevant film properties of the analyzed films are found to be ruled by the Cu content. Graded composition absorbers with adequate physical properties for the fabrication of photovoltaic devices are grown with a proper choice of growth parameters.
European Communities
Depto. de Estructura de la Materia, Física Térmica y Electrónica
Fac. de Ciencias Físicas
TRUE
pub
مصطلحات الفهرس: 537, Thin-Films., Electricidad, Electrónica (Física), 2202.03 Electricidad, journal article
URL: https://hdl.handle.net/20.500.14352/59308
http://scitation.aip.org/
JOU2-CT92-0141
الاتاحة: Open access content. Open access content
open access
ملاحظة: application/pdf
0003-6951
English
Other Numbers: ESRCM oai:docta.ucm.es:20.500.14352/59308
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0003-6951
10.1063/1.110851
1413946091
المصدر المساهم: REPOSITORIO E-PRINTS UNIVERSIDAD COMPLU
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رقم الانضمام: edsoai.on1413946091
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