Multilayer Badges Indicate Depths Of Ion Sputter Etches

التفاصيل البيبلوغرافية
العنوان: Multilayer Badges Indicate Depths Of Ion Sputter Etches
المؤلفون: Beattie, J. R, Matossian, J. N, Garvin, H. L
المصدر: NASA Tech Briefs. 18(7)
بيانات النشر: United States: NASA Center for Aerospace Information (CASI), 1994.
سنة النشر: 1994
مصطلحات موضوعية: Physical Sciences
الوصف: Multilayer badges devised to provide rapid, in-place indications of ion sputter etch rates. Badges conceived for use in estimating ion erosion of molybdenum electrodes used in inert-gas ion thrustors. Concept adapted to measure ion erosion in industrial sputter etching processes used for manufacturing of magnetic, electronic, and optical devices. Badge etched when bombarded by energetic ions. Badge layers exposed using mask. Contrast between layers facilitates counting of layers to determine etch depth.
نوع الوثيقة: Report
اللغة: English
تدمد: 0145-319X
URL الوصول: https://ntrs.nasa.gov/citations/19940000373
رقم الانضمام: edsnas.19940000373
قاعدة البيانات: NASA Technical Reports