Academic Journal
Studies on the Acid Formation and Deprotection Reaction by Novel Sulfonates in a Chemical Amplification Positive Photoresist
| العنوان: | Studies on the Acid Formation and Deprotection Reaction by Novel Sulfonates in a Chemical Amplification Positive Photoresist |
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| المؤلفون: | Hiroshi Shiraishi, Leo Schlegel, Nobuaki Hayashi, Takao Iwayanagi, Takumi Ueno |
| المصدر: | Journal of Photopolymer Science and Technology. 1990, 3(3):281 |
| قاعدة البيانات: | J-STAGE |
| تدمد: | 09149244 13496336 |
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| DOI: | 10.2494/photopolymer.3.281 |