Academic Journal
Diffusion Kinetic of Vapor-phase Silylation Process for ArF Lithography
| العنوان: | Diffusion Kinetic of Vapor-phase Silylation Process for ArF Lithography |
|---|---|
| المؤلفون: | Koichi Kuhara, Masaru Sasago, Masayuki Endo, Nobuyuki Matsuzawa, Shigeyasu Mori, Takahiro Matsuo, Taku Morisawa, Yuko Kaimoto |
| المصدر: | Journal of Photopolymer Science and Technology. 1997, 10(4):603 |
| قاعدة البيانات: | J-STAGE |
| تدمد: | 09149244 13496336 |
|---|---|
| DOI: | 10.2494/photopolymer.10.603 |