Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography

التفاصيل البيبلوغرافية
العنوان:	Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography
المؤلفون:	Anthony Lisi, Dah Chung Owe-Yang, Daniel D. Sanders, Dario L. Goldfarb, David R. Medeiros, Dirk Pfeiffer, John Arnold, Karen Petrillo, Kazumi Noda, Libor Vyklicky, Robert D. Allen, Sean D. Burns, Seiichiro Tachiban, Shozo Shirai
المصدر:	Journal of Photopolymer Science and Technology. 2008, 21(3):397
قاعدة البيانات:	J-STAGE

الوصف
تدمد:	09149244 13496336
DOI:	10.2494/photopolymer.21.397