Academic Journal
Peeling Analysis of ArF Resist Pattern on BARC by using AFM
| العنوان: | Peeling Analysis of ArF Resist Pattern on BARC by using AFM |
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| المؤلفون: | Akira Kawai, Kazutoshi Kurano, Takahiro Kishioka, Takuya Ohashi, Yoshiomi Hiroi |
| المصدر: | Journal of Photopolymer Science and Technology. 2007, 20(6):825 |
| قاعدة البيانات: | J-STAGE |
| تدمد: | 09149244 13496336 |
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| DOI: | 10.2494/photopolymer.20.825 |