Academic Journal
Oxime Sulfonate Chemistry for Advanced Microlithography
| العنوان: | Oxime Sulfonate Chemistry for Advanced Microlithography |
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| المؤلفون: | Akira Matsumoto, Hitoshi Yamamoto, Jean-Luc Birbaum, Junichi Tanabe, Masaki Ohwa, Peter Murer, Tobias Hinterman, Toshikage Asakura, Yuichi Nishimae |
| المصدر: | Journal of Photopolymer Science and Technology. 2007, 20(5):637 |
| قاعدة البيانات: | J-STAGE |
| تدمد: | 09149244 13496336 |
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| DOI: | 10.2494/photopolymer.20.637 |