Academic Journal
Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer
| العنوان: | Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer |
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| المؤلفون: | Seiichi Tagawa, Takahiro Kozawa, Toshiyuki Kai, Tsutomu Shimokawa |
| المصدر: | Journal of Photopolymer Science and Technology. 2007, 20(4):577 |
| قاعدة البيانات: | J-STAGE |
| تدمد: | 09149244 13496336 |
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| DOI: | 10.2494/photopolymer.20.577 |