Academic Journal

Effect of Substrate Temperature on a-Si:H Thin Films Fa-bricated by Double Tubed Coaxial Line Type Microwave Plasma CYD

التفاصيل البيبلوغرافية
العنوان: Effect of Substrate Temperature on a-Si:H Thin Films Fa-bricated by Double Tubed Coaxial Line Type Microwave Plasma CYD
المؤلفون: Isamu Kato, Kazuhisa Hatanaka, Tetsuya Ueda
المصدر: The transactions of the Institute of Electrical Engineers of Japan.A. 1986, 106(8):391
قاعدة البيانات: J-STAGE
الوصف
تدمد:03854205
13475533
DOI:10.1541/ieejfms1972.106.391