Academic Journal

Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture

التفاصيل البيبلوغرافية
العنوان: Drain Current Model for Double Gate Tunnel-FETs with InAs/Si Heterojunction and Source-Pocket Architecture
المؤلفون: Hongliang Lu, Bin Lu, Yuming Zhang, Yimen Zhang, Zhijun Lv
المصدر: Nanomaterials, Vol 9, Iss 2, p 181 (2019)
بيانات النشر: MDPI AG, 2019.
سنة النشر: 2019
المجموعة: LCC:Chemistry
مصطلحات موضوعية: TFET, BTBT, InAs/Si, heterojunction, staggered-bandgap, source-pocket, 2D Poisson equations, parabolic approximation, Kane’s model, current model, Chemistry, QD1-999
الوصف: The practical use of tunnel field-effect transistors is retarded by the low on-state current. In this paper, the energy-band engineering of InAs/Si heterojunction and novel device structure of source-pocket concept are combined in a single tunnel field-effect transistor to extensively boost the device performance. The proposed device shows improved tunnel on-state current and subthreshold swing. In addition, analytical potential model for the proposed device is developed and tunneling current is also calculated. Good agreement of the modeled results with numerical simulations verifies the validation of our model. With significantly reduced simulation time while acceptable accuracy, the model would be helpful for the further investigation of TFET-based circuit simulations.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 2079-4991
Relation: https://www.mdpi.com/2079-4991/9/2/181; https://doaj.org/toc/2079-4991
DOI: 10.3390/nano9020181
URL الوصول: https://doaj.org/article/884a34832f314243bb6e6a7763446c07
رقم الانضمام: edsdoj.884a34832f314243bb6e6a7763446c07
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:20794991
DOI:10.3390/nano9020181