Academic Journal

Photodegradation of Ciprofloxacin-Zinc Complexes Produced at the Interface of ZnO and Cu-Doped ZnO Crystals

التفاصيل البيبلوغرافية
العنوان: Photodegradation of Ciprofloxacin-Zinc Complexes Produced at the Interface of ZnO and Cu-Doped ZnO Crystals
المؤلفون: Aryane Tofanello, Elisângela Belleti, Adrianne M. M. Brito, Iseli L. Nantes-Cardoso
المصدر: Materials Research, Vol 24, Iss 6 (2021)
بيانات النشر: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol), 2021.
سنة النشر: 2021
المجموعة: LCC:Materials of engineering and construction. Mechanics of materials
مصطلحات موضوعية: Ciprofloxacin, emergent pollutant, photodegradation, ZnO, Cu-ZnO nanoetching, Materials of engineering and construction. Mechanics of materials, TA401-492
الوصف: Abstract Ciprofloxacin hydrochloride (CIPRO) is considered an emerging pollutant in aquatic environments with the capacity to disseminate antibiotic resistance. Considering the pro-oxidant potential of ZnO and Cu-doped ZnO (Cu-ZnO) wurtzite crystals, the potential Ciprofloxacin photodegradation by these materials was investigated. CIPRO titration with ZnO and Cu-ZnO promoted the formation of zinc complexes and ~4% antibiotic adsorption. The carboxylic groups of CIPRO can complex Zn2+ by promoting the nanoetching of ZnO and Cu-ZnO crystallite surfaces. The alkaline interfaces provided by ZnO create a microenvironment favorable for Zn2+ chelation by CIPRO carboxylates. The photodegradation degree was similar for CIPRO and CIPRO-Zn under UV light, as revealed by UV-visible spectroscopy and FTIR. Therefore, the ZnO and Cu-ZnO crystals contributed to the formation of CIPRO-Zn rather than the photo-oxidative degradation of the antibiotic. Considering that CIPRO-Zn chelates disfavor bacterial selection for resistance, the treatment of CIPRO-contaminated effluents with ZnO and Cu-ZnO can facilitate desirable metal chelation without impairing photodegradation.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 1516-1439
1980-5373
Relation: http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392021000600201&tlng=en; https://doaj.org/toc/1516-1439
DOI: 10.1590/1980-5373-mr-2021-0198
URL الوصول: https://doaj.org/article/2843ff997c6c4f1996fac7766beb99be
رقم الانضمام: edsdoj.2843ff997c6c4f1996fac7766beb99be
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:15161439
19805373
DOI:10.1590/1980-5373-mr-2021-0198