Academic Journal

Comparison of Plasmonic Arrays of Holes Recorded by Interference Lithography and Focused Ion Beam

التفاصيل البيبلوغرافية
العنوان: Comparison of Plasmonic Arrays of Holes Recorded by Interference Lithography and Focused Ion Beam
المؤلفون: J. W. Menezes, L. A. M. Barea, E. F. Chillcce, N. Frateschi, L. Cescato
المصدر: IEEE Photonics Journal, Vol 4, Iss 2, Pp 544-551 (2012)
بيانات النشر: IEEE, 2012.
سنة النشر: 2012
المجموعة: LCC:Applied optics. Photonics
LCC:Optics. Light
مصطلحات موضوعية: Lithography, interference, focused ion beam, plasmonics, Applied optics. Photonics, TA1501-1820, Optics. Light, QC350-467
الوصف: In this paper, we compare the geometric characteristics and the optical properties of plasmonic hole arrays recorded in gold (Au) films using two different techniques, namely, focused ion beam (FIB) and interference lithography (IL). The morphology of the samples was analyzed using a scanning electron microscope (SEM), and the plasmonic peaks were measured from the transmission spectrum of the samples. The diameters of the holes recorded by IL present approximately the same statistical deviation as those fabricated by FIB but in a much larger area. Although the transmittance measurements of both types of samples exhibit the characteristic plasmonic peaks, the intrinsic fabrication errors of each technique affect differently the optical spectra.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 1943-0655
Relation: https://ieeexplore.ieee.org/document/6166841/; https://doaj.org/toc/1943-0655
DOI: 10.1109/JPHOT.2012.2190497
URL الوصول: https://doaj.org/article/d218708f1fb54b66a7f83aec796162b5
رقم الانضمام: edsdoj.218708f1fb54b66a7f83aec796162b5
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:19430655
DOI:10.1109/JPHOT.2012.2190497