Academic Journal

Substrate Bias Stress Induced Kink Effect in GaN-on-Silicon High-Electron-Mobility Transistor

التفاصيل البيبلوغرافية
العنوان: Substrate Bias Stress Induced Kink Effect in GaN-on-Silicon High-Electron-Mobility Transistor
المؤلفون: Ramdas P. Khade, Sujan Sarkar, Ajay Shanbhag, Amitava DasGupta, Nandita DasGupta
المصدر: IEEE Journal of the Electron Devices Society, Vol 11, Pp 294-302 (2023)
بيانات النشر: IEEE, 2023.
سنة النشر: 2023
المجموعة: LCC:Electrical engineering. Electronics. Nuclear engineering
مصطلحات موضوعية: AlInN/GaN-on-Si HEMTs, kink effect, Si-substrate stress, buffer traps, drain current transient, Electrical engineering. Electronics. Nuclear engineering, TK1-9971
الوصف: In this paper, kink effect observed in the output characteristics of the AlInN/GaN-on-Si high electron mobility transistor (HEMT) after subjecting the Si-substrate to positive/negative bias stress has been studied. The charge distribution in the different buffer layers of the wafer in the presence of different substrate-bias stress has been discussed in detail. It is concluded that the induced kink is due to the trapping/de-trapping of charge carriers through acceptor-like deep levels present in the GaN buffer layer. TCAD simulations have been performed to understand the electric-field distribution within the device layers, which is strongly related to the observed kink phenomenon. Two types of traps, acceptor-like (Ea1 = 0.52 eV) and donor-like (Ea2 = 0.44 eV), were extracted from temperature-dependent drain current transient analysis using back-gating experiment. It is concluded that a carbon-induced deep acceptor-like trap is responsible for the observed kink effect.
نوع الوثيقة: article
وصف الملف: electronic resource
اللغة: English
تدمد: 2168-6734
Relation: https://ieeexplore.ieee.org/document/10122951/; https://doaj.org/toc/2168-6734
DOI: 10.1109/JEDS.2023.3275277
URL الوصول: https://doaj.org/article/c19c78361dc74771b4ce412633caa0fc
رقم الانضمام: edsdoj.19c78361dc74771b4ce412633caa0fc
قاعدة البيانات: Directory of Open Access Journals
الوصف
تدمد:21686734
DOI:10.1109/JEDS.2023.3275277