Conference
Towards reliable directed self-assembly lithography for future CMOS scaling: A study on variability of cylindrical patterns
| العنوان: | Towards reliable directed self-assembly lithography for future CMOS scaling: A study on variability of cylindrical patterns |
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| المؤلفون: | Boeckx, Carolien, Doise, Jan, Gronheid, Roel, Cao, Yi, De Gendt, Stefan |
| سنة النشر: | 2015 |
| المجموعة: | KU Leuven: Lirias |
| مصطلحات موضوعية: | DSA, Lithography |
| الوصف: | Directed self-assembly (DSA) of block co-polymers (BCP) is a promising candidate for frequency multiplication below 20nm half-pitch. In this study we will focus on the generation of holes using cylindrical phase BCP materials. One way to do so, is by means of grapho-epitaxy where physical confinement is used. Grapho-epitaxy is preferentially used for generating more random patterns compared to chemo-epitaxy making it of particular interest for logic applications. Conventional lithography techniques are used to create a pre-patterned template. After surface energy modification, the BCP is deposited in the pre-patterned holes and annealed at elevated temperature. During the anneal the polymer phase separates and forms the desired cylindrical patterns. Subsequently, the minority block is removed by a wet development step (Figure 1). [1] Issues that need to be tackled before DSA can be implemented in device manufacturing are placement accuracy and dimensional variability of the contact holes. This problem is complicated by the fact that the metrology for pattern placement accuracy for DSA applications is not fully developed. Current methods mainly depend on simultaneous observation of the template and the BCP structure. The drawback of this approach is that the template contour is often impacted by the BCP processing, resulting in increased metrology noise for measuring the template position. This work focusses on the origin and impact of different parameters on the CD and placement variability. First, novel metrology structures are evaluated for the characterization of DSA pattern placement accuracy. Second, experiments are set up to determine the parameters that need to be controlled for high fidelity pattern formation. These include the geometry and substrate surface energy of the physical confinement well, the impact of BCP material related properties, and the impact of processing conditions. ; status: submitted |
| نوع الوثيقة: | conference object |
| وصف الملف: | 233166 bytes; application/pdf |
| اللغة: | English |
| Relation: | International DSA symposium edition:1 location:Leuven date:25-27 October; https://lirias.kuleuven.be/handle/123456789/558411; https://lirias.kuleuven.be/bitstream/123456789/558411/1//Abstract_CB.pdf |
| الاتاحة: | https://lirias.kuleuven.be/handle/123456789/558411 https://lirias.kuleuven.be/bitstream/123456789/558411/1//Abstract_CB.pdf |
| رقم الانضمام: | edsbas.FFE35A31 |
| قاعدة البيانات: | BASE |
| الوصف غير متاح. |