Academic Journal
Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
| العنوان: | Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
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| المؤلفون: | Tarala, V A, Altakhov, A S, Martens, V Ya, Lisitsyn, S V |
| المصدر: | Journal of Physics: Conference Series ; volume 652, page 012034 ; ISSN 1742-6588 1742-6596 |
| بيانات النشر: | IOP Publishing |
| سنة النشر: | 2015 |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | unknown |
| DOI: | 10.1088/1742-6596/652/1/012034 |
| الاتاحة: | http://dx.doi.org/10.1088/1742-6596/652/1/012034 http://stacks.iop.org/1742-6596/652/i=1/a=012034/pdf http://stacks.iop.org/1742-6596/652/i=1/a=012034?key=crossref.a7b24122ffa08a784d0bb3f156d91737 |
| Rights: | http://iopscience.iop.org/info/page/text-and-data-mining ; http://creativecommons.org/licenses/by/3.0/ |
| رقم الانضمام: | edsbas.F74F8CB |
| قاعدة البيانات: | BASE |
| DOI: | 10.1088/1742-6596/652/1/012034 |
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