Academic Journal
Macroporous layers formation on n-Si substrates in an HF-containing electrolyte adding HCl
| العنوان: | Macroporous layers formation on n-Si substrates in an HF-containing electrolyte adding HCl |
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| المؤلفون: | V. V. Bolotov, K. E. Ivlev, I. V. Ponomareva |
| المصدر: | Омский научный вестник, Vol 3 (171), Pp 65-69 (2020) |
| بيانات النشر: | Omsk State Technical University, Federal State Budgetary Educational Institution of Higher Education |
| سنة النشر: | 2020 |
| المجموعة: | Directory of Open Access Journals: DOAJ Articles |
| مصطلحات موضوعية: | porous silicon, electrochemical etching, electron microscopy, Engineering (General). Civil engineering (General), TA1-2040 |
| الوصف: | Adding an oxidizing agent to a solution of hydrofluoric acid significantly changes the process of electrochemical etching, because allows to accelerate the dissolution of electron silicon. In this work, we studied the formation process and morphology of macropores in high-resistance n-Si depending on the concentration of HCl in the HF: C2 H5 OH electrolyte. It is shown that the presence of HCl leads to a more uniform pore diameter distribution both at the surface and in the layer depth, and the increase in etching rate. With an increase in HCl concentration, a narrower pore diameter distribution is observed; the main pores near the surface approximate in size to the pores in the depth of the porous layer. The results are explained by the action of HCl as an oxidant. |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English Russian |
| تدمد: | 1813-8225 2541-7541 |
| Relation: | https://www.omgtu.ru/general_information/media_omgtu/journal_of_omsk_research_journal/files/arhiv/2020/3%20(171)/65-69%20%D0%91%D0%BE%D0%BB%D0%BE%D1%82%D0%BE%D0%B2%20%D0%92.%20%D0%92.,%20%D0%98%D0%B2%D0%BB%D0%B5%D0%B2%20%D0%9A.%20%D0%95.,%20%D0%9F%D0%BE%D0%BD%D0%BE%D0%BC%D0%B0%D1%80%D0%B5%D0%B2%D0%B0%20%D0%98.%20%D0%92.pdf; https://doaj.org/toc/1813-8225; https://doaj.org/toc/2541-7541; https://doaj.org/article/8b299d21f4c143e4911a4afd00f0280c |
| DOI: | 10.25206/1813-8225-2020-171-65-69 |
| الاتاحة: | https://doi.org/10.25206/1813-8225-2020-171-65-69 https://doaj.org/article/8b299d21f4c143e4911a4afd00f0280c |
| رقم الانضمام: | edsbas.EFCFDC23 |
| قاعدة البيانات: | BASE |
| تدمد: | 18138225 25417541 |
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| DOI: | 10.25206/1813-8225-2020-171-65-69 |