Academic Journal
Effect of rapid thermal annealing on damage of silicon matrix implanted by low-energy rhenium ions
| العنوان: | Effect of rapid thermal annealing on damage of silicon matrix implanted by low-energy rhenium ions |
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| المؤلفون: | Demchenko, I.N., Melikhov, Y., Walczak, M.S., Ratajczak, R., Sobczak, K., Barcz, A., Minikaev, R., Dynowska, E., Domagala, J.Z., Chernyshova, M., Syryanyy, Y., Gavrilov, N.V., Sawicki, M. |
| المساهمون: | TEM, Interdisciplinary Centre for Mathematical and Computational Modelling (ICM) at University of Warsaw, Poland |
| المصدر: | Journal of Alloys and Compounds ; volume 846, page 156433 ; ISSN 0925-8388 |
| بيانات النشر: | Elsevier BV |
| سنة النشر: | 2020 |
| المجموعة: | ScienceDirect (Elsevier - Open Access Articles via Crossref) |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1016/j.jallcom.2020.156433 |
| الاتاحة: | http://dx.doi.org/10.1016/j.jallcom.2020.156433 https://api.elsevier.com/content/article/PII:S0925838820327973?httpAccept=text/xml https://api.elsevier.com/content/article/PII:S0925838820327973?httpAccept=text/plain |
| Rights: | https://www.elsevier.com/tdm/userlicense/1.0/ |
| رقم الانضمام: | edsbas.CE956F15 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/j.jallcom.2020.156433 |
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