Academic Journal
Structural investigation of thin films of Ti1−xAlxN ternary nitrides using Ti K-edge X-ray absorption fine structure
| العنوان: | Structural investigation of thin films of Ti1−xAlxN ternary nitrides using Ti K-edge X-ray absorption fine structure |
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| المؤلفون: | Tuilier, Marie-Helene, Pac, Marie-Jose, Covarel, Gregory, Rousselot, C., Khouchaf, L. |
| المساهمون: | Laboratoire de Physique et Mécanique Textiles - LPMT - UR4365 (LPMT), Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Matériaux et Nanosciences Grand-Est (MNGE), Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS), Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174) (FEMTO-ST), Université de Technologie de Belfort-Montbeliard (UTBM)-Ecole Nationale Supérieure de Mécanique et des Microtechniques (ENSMM)-Centre National de la Recherche Scientifique (CNRS)-Université de Franche-Comté (UFC), Université Bourgogne Franche-Comté COMUE (UBFC)-Université Bourgogne Franche-Comté COMUE (UBFC), École des Mines de Douai (Mines Douai EMD), Institut Mines-Télécom Paris (IMT) |
| المصدر: | ISSN: 0257-8972. |
| بيانات النشر: | HAL CCSD Elsevier |
| سنة النشر: | 2007 |
| مصطلحات موضوعية: | Atomic structures, Ti 1−xAlxN films, Reactive sputtering, XAFS, X-ray diffraction, [SPI.MAT]Engineering Sciences [physics]/Materials |
| الوصف: | International audience ; Thin films of Ti1−xAlxN nitrides were prepared over a large range of composition (0 ≤ x < 1) on Si substrates using nitrogen reactive magnetron sputtering from composite metallic targets. Ti K-edge X-ray Absorption Spectroscopy experiments were carried for a better understanding of the local structure. The evolution of the intensity of Ti K-edge pre-edge peak gives evidence of the incorporation of Ti in hexagonal lattice of AlN for Al-rich films and in cubic lattice of TiN for Ti-rich films. An attempt to determine their atomic structure by combining X-ray diffraction and Ti K-edge Extended X-ray Absorption Fine Structure is presented. The evolution of the nearest neighbour and next-nearest neighbour distances depending on the composition is presented and discussed together the cubic and hexagonal lattice parameters. A possible contribution of amorphous nitrides is suggested. |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| Relation: | hal-03633324; https://hal.science/hal-03633324 |
| DOI: | 10.1016/j.surfcoat.2006.09.095 |
| الاتاحة: | https://hal.science/hal-03633324 https://doi.org/10.1016/j.surfcoat.2006.09.095 |
| رقم الانضمام: | edsbas.C8C4BCAC |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/j.surfcoat.2006.09.095 |
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