Impact of Process Variations on Back-Bias Effect in 100V p-GaN Gate AlGaN/GaN HEMTs

التفاصيل البيبلوغرافية
العنوان: Impact of Process Variations on Back-Bias Effect in 100V p-GaN Gate AlGaN/GaN HEMTs
المؤلفون: Cioni M., Giorgino G., Chini A., Marletta G., Miccoli C., Castagna M. E., Luongo G., Moschetti M., Tringali C., Iucolano F.
المساهمون: Cioni, M., Giorgino, G., Chini, A., Marletta, G., Miccoli, C., Castagna, M. E., Luongo, G., Moschetti, M., Tringali, C., Iucolano, F.
بيانات النشر: Institute of Electrical and Electronics Engineers Inc.
سنة النشر: 2023
المجموعة: Archivio della ricerca dell'Università di Modena e Reggio Emilia (Unimore: IRIS)
مصطلحات موضوعية: 2-DEG density, Back-Effect, GaN HEMT, RON-degradation, Vertical Leakage, VTH drift
الوصف: In this paper, we investigate the impact of Buffer resistivity and AlGaN barrier design on back-bias stress performed on 100 V p-GaN gate AlGaN/GaN HEMTs. To this end, we compare the results obtained in terms of (i) vertical leakage, (ii) back-bias stress on Transmission Line Measurements (TLM) structures and (iii) back-gating on real transistors. Concerning the latter, a novel test sequence is implemented to monitor the drain current evolution during the stress and evaluate the impact on V TH and R ON parameters after 1000 s stress with V SUB =-50 V. Results indicate that high resistive buffer can significantly reduce the back-bias effect, but also the AlGaN barrier design can affect the parameters drift due to a different two-dimensional electron gas (2DEG) density.
نوع الوثيقة: conference object
اللغة: English
Relation: info:eu-repo/semantics/altIdentifier/isbn/979-8-3503-3713-6; ispartofbook:2023 IEEE 10th Workshop on Wide Bandgap Power Devices and Applications, WiPDA 2023; 10th IEEE Workshop on Wide Bandgap Power Devices and Applications, WiPDA 2023; https://hdl.handle.net/11380/1332187; info:eu-repo/semantics/altIdentifier/scopus/2-s2.0-85183585579
DOI: 10.1109/WiPDA58524.2023.10382224
الاتاحة: https://hdl.handle.net/11380/1332187
https://doi.org/10.1109/WiPDA58524.2023.10382224
رقم الانضمام: edsbas.AD7D5671
قاعدة البيانات: BASE
الوصف
DOI:10.1109/WiPDA58524.2023.10382224