Academic Journal
Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography
| العنوان: | Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography |
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| المؤلفون: | Zhang, Hui, Huda, Miftakhul, Komori, Takuya, Zhang, Yulong, Yin, You, Hosaka, Sumio |
| المساهمون: | Ministry of Education, Culture, Sports, Science and Technology |
| المصدر: | Microelectronic Engineering ; volume 121, page 142-146 ; ISSN 0167-9317 |
| بيانات النشر: | Elsevier BV |
| سنة النشر: | 2014 |
| المجموعة: | ScienceDirect (Elsevier - Open Access Articles via Crossref) |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1016/j.mee.2014.04.039 |
| الاتاحة: | http://dx.doi.org/10.1016/j.mee.2014.04.039 https://api.elsevier.com/content/article/PII:S0167931714001865?httpAccept=text/xml https://api.elsevier.com/content/article/PII:S0167931714001865?httpAccept=text/plain |
| Rights: | https://www.elsevier.com/tdm/userlicense/1.0/ |
| رقم الانضمام: | edsbas.A637A989 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/j.mee.2014.04.039 |
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