Academic Journal
Process-induced losses by plasma leakage in lithography-free shadow masked interdigitated back contact silicon heterojunction architectures
| العنوان: | Process-induced losses by plasma leakage in lithography-free shadow masked interdigitated back contact silicon heterojunction architectures |
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| المؤلفون: | Soman, Anishkumar, Das, Ujjwal K., Ahmed, Nuha, Sinha, Arpan, Gupta, Mool C., Hegedus, Steven S. |
| المصدر: | Materials Science in Semiconductor Processing ; volume 166, page 107762 ; ISSN 1369-8001 |
| بيانات النشر: | Elsevier BV |
| سنة النشر: | 2023 |
| المجموعة: | ScienceDirect (Elsevier - Open Access Articles via Crossref) |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1016/j.mssp.2023.107762 |
| الاتاحة: | http://dx.doi.org/10.1016/j.mssp.2023.107762 https://api.elsevier.com/content/article/PII:S1369800123004559?httpAccept=text/xml https://api.elsevier.com/content/article/PII:S1369800123004559?httpAccept=text/plain |
| Rights: | https://www.elsevier.com/tdm/userlicense/1.0/ ; http://www.elsevier.com/open-access/userlicense/1.0/ ; https://doi.org/10.15223/policy-017 ; https://doi.org/10.15223/policy-037 ; https://doi.org/10.15223/policy-012 ; https://doi.org/10.15223/policy-029 ; https://doi.org/10.15223/policy-004 |
| رقم الانضمام: | edsbas.A31491D |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/j.mssp.2023.107762 |
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