Academic Journal
Deposition chemistry in the Cat-CVD processes of the SiH4/NH3 system
| العنوان: | Deposition chemistry in the Cat-CVD processes of the SiH4/NH3 system |
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| المؤلفون: | Umemoto, Hironobu, Morimoto, Takashi, Yamawaki, Moroyuki, Masuda, Yoshie, Masuda, Atsushi, Matsumura, Hideki |
| المصدر: | Thin Solid Films ; volume 430, issue 1-2, page 24-27 ; ISSN 0040-6090 |
| بيانات النشر: | Elsevier BV |
| سنة النشر: | 2003 |
| المجموعة: | ScienceDirect (Elsevier - Open Access Articles via Crossref) |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1016/s0040-6090(03)00124-x |
| الاتاحة: | http://dx.doi.org/10.1016/s0040-6090(03)00124-x https://api.elsevier.com/content/article/PII:S004060900300124X?httpAccept=text/xml https://api.elsevier.com/content/article/PII:S004060900300124X?httpAccept=text/plain |
| Rights: | https://www.elsevier.com/tdm/userlicense/1.0/ |
| رقم الانضمام: | edsbas.A1A82394 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/s0040-6090(03)00124-x |
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