Conference
Coater/developer-based patterning techniques to improve tight pitches towards high-NA EUV
| العنوان: | Coater/developer-based patterning techniques to improve tight pitches towards high-NA EUV |
|---|---|
| المؤلفون: | Kato, Kanzo, Huli, Lior, Grzeskowiak, Steven, Krawicz, Alexandra, Liu, Eric, Ko, Akiteru, Shimura, Satoru, Kawakami, Shinichiro, Dinh, Cong Q., Kitano, Takahiro, Nagahara, Seiji, Meli, Luciana, Seshadri, Indira, Burkhardt, Martin, Petrillo, Karen |
| المساهمون: | Burkhardt, Martin, van Lare, Claire |
| المصدر: | Optical and EUV Nanolithography XXXVII |
| بيانات النشر: | SPIE |
| سنة النشر: | 2024 |
| نوع الوثيقة: | conference object |
| اللغة: | unknown |
| DOI: | 10.1117/12.3010880 |
| الاتاحة: | http://dx.doi.org/10.1117/12.3010880 |
| رقم الانضمام: | edsbas.891FAAE7 |
| قاعدة البيانات: | BASE |
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