Academic Journal
Toward defect-free fabrication of extreme ultraviolet photomasks
| العنوان: | Toward defect-free fabrication of extreme ultraviolet photomasks |
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| المؤلفون: | Qi, Zhengqing John, Rankin, Jed H., Lawliss, Mark, Badger, Karen D., Turley, Christina |
| المصدر: | Journal of Micro/Nanolithography, MEMS, and MOEMS ; volume 15, issue 2, page 023502 ; ISSN 1932-5150 |
| بيانات النشر: | SPIE-Intl Soc Optical Eng |
| سنة النشر: | 2016 |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1117/1.jmm.15.2.023502 |
| الاتاحة: | http://dx.doi.org/10.1117/1.jmm.15.2.023502 http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=2514145 |
| رقم الانضمام: | edsbas.720C1561 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1117/1.jmm.15.2.023502 |
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