التفاصيل البيبلوغرافية
| العنوان: |
Intrinsic Properties and Future Perspective of HfO2/V2O5/HfO2 Multi-Layer Thin Films via E-Beam Evaporation as a Transparent Heat Mirror |
| المؤلفون: |
Daniyal Asif Cheema, Muhammad Osama Danial, Muhammad Bilal Hanif, Abdulaziz Salem Alghamdi, Mohamed Ramadan, Abdul Khaliq, Abdul Faheem Khan, Tayyab Subhani, Martin Motola |
| المصدر: |
Coatings; Volume 12; Issue 4; Pages: 448 |
| بيانات النشر: |
Multidisciplinary Digital Publishing Institute |
| سنة النشر: |
2022 |
| المجموعة: |
MDPI Open Access Publishing |
| مصطلحات موضوعية: |
V 2 O 5, HfO 2, multi-layer, thin films, transparent heat mirror |
| الوصف: |
HfO2 and V2O5 as multi-layer thin films are discussed for their potential use as transparent heat mirrors. Multi-layered HfO2/V2O5/HfO2 thin films with a thickness of 100/60/100 nm were prepared via e-beam evaporation on a soda–lime glass substrate. Rutherford backscattering confirmed the multi-layer structure with uniform surface. The as-deposited thin films were annealed at 300 °C and 400 °C, respectively, for 1 h in air. The transmittance of approximately 90% was obtained for all thin films. Due to the relatively low thickness and non-stoichiometry of HfO2, a band gap of approximately 3.25 eV was determined (instead of the theoretical 5.3–5.7 eV). The as-deposited thin films possessed conductivity of approximately 0.2 Ω−1cm−1 and increased to 1 Ω−1cm−1 and 2 Ω−1cm−1 for thin films annealed at 300 and 400 °C, respectively. Due to the unique intrinsic properties of HfO2/V2O5/HfO2 thin films, the results obtained are promising for application as a transparent heat mirror. |
| نوع الوثيقة: |
text |
| وصف الملف: |
application/pdf |
| اللغة: |
English |
| Relation: |
Surface Characterization, Deposition and Modification; https://dx.doi.org/10.3390/coatings12040448 |
| DOI: |
10.3390/coatings12040448 |
| الاتاحة: |
https://doi.org/10.3390/coatings12040448 |
| Rights: |
https://creativecommons.org/licenses/by/4.0/ |
| رقم الانضمام: |
edsbas.6B7C28B4 |
| قاعدة البيانات: |
BASE |