Academic Journal

Electrical response of electron selective atomic layer deposited TiO2-x heterocontacts on crystalline silicon substrates

التفاصيل البيبلوغرافية
العنوان: Electrical response of electron selective atomic layer deposited TiO2-x heterocontacts on crystalline silicon substrates
المؤلفون: Ahiboz, Doguscan, Nasser, Hisham, Aygun, Ezgi, Bek, Alpan, Turan, Raşit
بيانات النشر: IOP Publishing
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
سنة النشر: 2018
مصطلحات موضوعية: Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Condensed Matter Physics
الوصف: Integration of oxygen deficient sub-stoichiometric titanium dioxide (TiO2-x) thin films as the electron transporting-hole blocking layer in solar cell designs are expected to reduce fabrication costs by eliminating high temperature processes while maintaining high conversion efficiencies. In this paper, we conducted a study to reveal the electrical properties of TiO2-x thin films grown on crystalline silicon (c-Si) substrates by atomic layer deposition (ALD) technique. Effect of ALD substrate temperature, post deposition annealing, and doping type of the c-Si substrate on the interface states and TiO2-x bulk properties were extracted by performing admittance (C-V, G-V) and current-voltage (J-V) measurements. Moreover, the asymmetry in C-V and J-V measurements between the p-n type and n-n TiO2-x-c-Si heterojunction types were examined and the electron transport selectivity of TiO2-x was revealed.
نوع الوثيقة: article in journal/newspaper
اللغة: unknown
تدمد: 0268-1242
Relation: Ahiboz D., Nasser H., Aygun E., Bek A., Turan R., "Electrical response of electron selective atomic layer deposited TiO2-x heterocontacts on crystalline silicon substrates", SEMICONDUCTOR SCIENCE AND TECHNOLOGY, cilt.33, 2018; 85044933920; https://hdl.handle.net/11511/37878; 33; WOS:000428463500001
DOI: 10.1088/1361-6641/aab535
الاتاحة: https://hdl.handle.net/11511/37878
https://doi.org/10.1088/1361-6641/aab535
Rights: Attribution-NonCommercial-NoDerivatives 4.0 International ; http://creativecommons.org/licenses/by-nc-nd/4.0/
رقم الانضمام: edsbas.60E8A863
قاعدة البيانات: BASE
الوصف
تدمد:02681242
DOI:10.1088/1361-6641/aab535