Academic Journal

OBTAINING A STRUCTURALLY PERFECT SEMICONDUCTOR SOLID SOLUTION SI1-X GEX WITH SPECIFIED ELECTROPHYSICAL AND PHOTOELECTRIC PROPERTIES

التفاصيل البيبلوغرافية
العنوان: OBTAINING A STRUCTURALLY PERFECT SEMICONDUCTOR SOLID SOLUTION SI1-X GEX WITH SPECIFIED ELECTROPHYSICAL AND PHOTOELECTRIC PROPERTIES
المؤلفون: Razzokov, A Sh, Khakimov, N Z, Davletov, I Y, Eshchanov, Kh O, Matnazarov, A R
المصدر: Scientific-technical journal
بيانات النشر: 2030 Uzbekistan Research Online
سنة النشر: 2020
المجموعة: Uzbekistan Research Online
مصطلحات موضوعية: epitaxy, crystallization, solution-melt, X-ray diffractogram, solid solution, coagulation, dislocation, substrate, nanocluster, chemical potential, structure
الوصف: Single-crystal films of Si1-xGex (0 substrates from a tin solution-melt at a temperature in the range of the onset of crystallization To.c.= 800°С÷1050°С by liquid-phase epitaxy. The dependence of the formation of dislocations at the substrate-film interface on the number and size of the formation of nanoclusters in the solution-melt during the growth of the Si1-xGex solid solution has been studied. Optimal technological growth modes for obtaining crystalline perfect epitaxial layers and structures are presented.
نوع الوثيقة: text
وصف الملف: application/pdf
اللغة: Russian
Relation: https://uzjournals.edu.uz/ferpi/vol3/iss5/10; https://uzjournals.edu.uz/cgi/viewcontent.cgi?article=1424&context=ferpi
الاتاحة: https://uzjournals.edu.uz/ferpi/vol3/iss5/10
https://uzjournals.edu.uz/cgi/viewcontent.cgi?article=1424&context=ferpi
رقم الانضمام: edsbas.5E933AF1
قاعدة البيانات: BASE