Academic Journal
Thermal stability and oxygen-loss characteristics of Pt(O) films prepared by reactive sputtering
| العنوان: | Thermal stability and oxygen-loss characteristics of Pt(O) films prepared by reactive sputtering |
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| المؤلفون: | Saenger, K. L., Cabral, C., Lavoie, C., Rossnagel, S. M. |
| المصدر: | Journal of Applied Physics ; volume 86, issue 11, page 6084-6087 ; ISSN 0021-8979 1089-7550 |
| بيانات النشر: | AIP Publishing |
| سنة النشر: | 1999 |
| الوصف: | Pt(O) films having compositions ranging from pure Pt to amorphous platinum oxide a-PtOx (x∼1.4) were prepared by reactive sputtering and examined during and after heating to temperatures used for deposition and processing of high-epsilon (HE) and ferroelectric (FE) materials (400–650 °C). A two stage decomposition process was observed for a-PtOx (x∼1.4) films heated in N2, with the first stage of decomposition beginning at temperatures well below 400 °C. In an O2 ambient, decomposition was accompanied by formation of a crystalline Pt3O4 phase prior to complete decomposition to metallic Pt. However, the relatively slow rate of oxygen loss from a-PtOx suggests that significant amounts of oxygen should remain in Pt(O) electrodes after HE/FE layer deposition. |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1063/1.371718 |
| الاتاحة: | http://dx.doi.org/10.1063/1.371718 https://pubs.aip.org/aip/jap/article-pdf/86/11/6084/18980124/6084_1_online.pdf |
| رقم الانضمام: | edsbas.5D20A21B |
| قاعدة البيانات: | BASE |
| DOI: | 10.1063/1.371718 |
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