Report
Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing
| العنوان: | Fabrication of Ultra-High Q Silica Microdisk Using Chemo-Mechanical Polishing |
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| المؤلفون: | S. Honari (14386569), S. Haque (8056316), Tao Lu (39406) |
| سنة النشر: | 2021 |
| مصطلحات موضوعية: | Physics (arXiv), physics.optics (arXiv), cond-mat.mtrl-sci (arXiv) |
| الوصف: | Here we demonstrate that adding a chemo-mechanical polishing (CMP) procedure to conventional photolithography, a silica microdisk with ultra-high quality factors ($>10^8$) can be fabricated. By comparing with the intrinsic optical quality factor (Q) measured at 970~nm, we observe that due to the significantly reduced surface roughness, at 1550~nm wavelength the water molecule absorption at the cavity surface supersedes Rayleigh scattering as the dominant factor for Q degradation. |
| نوع الوثيقة: | report |
| اللغة: | unknown |
| Relation: | https://figshare.com/articles/preprint/Fabrication_of_Ultra-High_Q_Silica_Microdisk_Using_Chemo-Mechanical_Polishing/21871362 |
| DOI: | 10.48550/arxiv.2104.05227 |
| الاتاحة: | https://doi.org/10.48550/arxiv.2104.05227 |
| Rights: | CC0 |
| رقم الانضمام: | edsbas.5BAE685A |
| قاعدة البيانات: | BASE |
| DOI: | 10.48550/arxiv.2104.05227 |
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