Academic Journal
P‐7.9: Advanced Halftone Photolithography Using Four‐Mask Process Architecture for G8.6 TFT‐LCDs
| العنوان: | P‐7.9: Advanced Halftone Photolithography Using Four‐Mask Process Architecture for G8.6 TFT‐LCDs |
|---|---|
| المؤلفون: | Cho, An-Thung, Yang, Feng-yun, Liu, Zhen, Chao, Wei, Mo, Qiong-hua, Liu, Kai-jun, Ge, Bang-tong, Fu, Ting-ting, Zhou, Jeff, Hsu, James, Chen, Wade, Lu, York |
| المساهمون: | Municipal Administration of State Land, Resources and Housing, Chongqing Municipal Government |
| المصدر: | SID Symposium Digest of Technical Papers ; volume 50, issue S1, page 822-825 ; ISSN 0097-966X 2168-0159 |
| بيانات النشر: | Wiley |
| سنة النشر: | 2019 |
| المجموعة: | Wiley Online Library (Open Access Articles via Crossref) |
| الوصف: | Advanced four‐mask process a‐Si TFT array manufacturing method and good TFT stability is presented in this paper. We used an optimum half‐tone mask transmittance and half‐tone photoresist for the four‐mask process architecture. Data line open and photoresist peeling issues occurred in G8.6 TFT‐LCDs and solutions will be shown. |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1002/sdtp.13660 |
| الاتاحة: | http://dx.doi.org/10.1002/sdtp.13660 https://onlinelibrary.wiley.com/doi/pdf/10.1002/sdtp.13660 |
| Rights: | http://onlinelibrary.wiley.com/termsAndConditions#vor |
| رقم الانضمام: | edsbas.5B6AE439 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1002/sdtp.13660 |
|---|