Academic Journal
Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
| العنوان: | Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
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| المؤلفون: | Tarala, V., Ambartsumov, M., Altakhov, A., Martens, V., Shevchenko, M. |
| المصدر: | Journal of Crystal Growth ; volume 455, page 157-160 ; ISSN 0022-0248 |
| بيانات النشر: | Elsevier BV |
| سنة النشر: | 2016 |
| المجموعة: | ScienceDirect (Elsevier - Open Access Articles via Crossref) |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1016/j.jcrysgro.2016.10.015 |
| الاتاحة: | http://dx.doi.org/10.1016/j.jcrysgro.2016.10.015 https://api.elsevier.com/content/article/PII:S0022024816306078?httpAccept=text/xml https://api.elsevier.com/content/article/PII:S0022024816306078?httpAccept=text/plain |
| Rights: | https://www.elsevier.com/tdm/userlicense/1.0/ |
| رقم الانضمام: | edsbas.57C992FB |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/j.jcrysgro.2016.10.015 |
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