Helium ion microscopy for low-damage characterization and sub-10 nm nanofabrication

التفاصيل البيبلوغرافية
العنوان:	Helium ion microscopy for low-damage characterization and sub-10 nm nanofabrication
المؤلفون:	Ogawa, Shinichi
المساهمون:	Japan Society for the Promotion of Science
المصدر:	AAPPS Bulletin ; volume 32, issue 1 ; ISSN 2309-4710
بيانات النشر:	Springer Science and Business Media LLC
سنة النشر:	2022
الوصف:	This review introduces the technique of helium ion microscopy along with some unique applications of this technology in the fields of electronics and biology, as performed at the National Institute of Advanced Industrial Science and Technology, Japan, over the last several years. Observations of large-scale integrated circuits, analyses of low-dielectric-constant films with minimal damage, and assessments of copper metal in insulating films are discussed. The special characteristics of this technique are explained, including low-energy input to the material and minimal secondary electron energy resulting from helium ion irradiation. Applications to electronic materials, such as tuning the electrical conductivity of graphene films by helium ion beam irradiation and the formation of nanopore arrays on graphene films with nanometer-scale control, are presented. The use of helium ion microscopy to examine cellular tissues based on the low damage imparted by the ion beam is also evaluated.
نوع الوثيقة:	article in journal/newspaper
اللغة:	English
DOI:	10.1007/s43673-022-00050-7
DOI:	10.1007/s43673-022-00050-7.pdf
DOI:	10.1007/s43673-022-00050-7/fulltext.html
الاتاحة:	http://dx.doi.org/10.1007/s43673-022-00050-7 https://link.springer.com/content/pdf/10.1007/s43673-022-00050-7.pdf https://link.springer.com/article/10.1007/s43673-022-00050-7/fulltext.html
Rights:	https://creativecommons.org/licenses/by/4.0 ; https://creativecommons.org/licenses/by/4.0
رقم الانضمام:	edsbas.455CFED3
قاعدة البيانات:	BASE

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الوصف
DOI:	10.1007/s43673-022-00050-7