Academic Journal

Praseodymium Silicate as a High-k Dielectric Candidate: An Insight into the Pr 2 O 3 -Film/Si-Substrate Interface Fabricated Through a Metal-Organic Chemical Vapor Deposition Process

التفاصيل البيبلوغرافية
العنوان: Praseodymium Silicate as a High-k Dielectric Candidate: An Insight into the Pr 2 O 3 -Film/Si-Substrate Interface Fabricated Through a Metal-Organic Chemical Vapor Deposition Process
المؤلفون: Lo Nigro, R., Toro, R. G., Malandrino, G., Condorelli, G. G., Raineri, V., Fragalà, I. L.
المصدر: Advanced Functional Materials ; volume 15, issue 5, page 838-845 ; ISSN 1616-301X
بيانات النشر: Wiley
سنة النشر: 2005
المجموعة: Wiley Online Library (Open Access Articles via Crossref)
نوع الوثيقة: article in journal/newspaper
اللغة: English
DOI: 10.1002/adfm.200300346
الاتاحة: http://dx.doi.org/10.1002/adfm.200300346
https://api.wiley.com/onlinelibrary/tdm/v1/articles/10.1002%2Fadfm.200300346
https://onlinelibrary.wiley.com/doi/full/10.1002/adfm.200300346
Rights: http://doi.wiley.com/10.1002/tdm_license_1.1
رقم الانضمام: edsbas.453343DD
قاعدة البيانات: BASE