Academic Journal
Performance Investigation of an n-Type Tin-Oxide Thin Film Transistor by Channel Plasma Processing
| العنوان: | Performance Investigation of an n-Type Tin-Oxide Thin Film Transistor by Channel Plasma Processing |
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| المؤلفون: | Shang, Z. W., Ma, J., Liu, W. D., Fan, Y. C., Hsu, H. H., Zheng, Z. W., Cheng, C. H. |
| المساهمون: | National Natural Science Foundation of China, Fundamental Research Funds for the Central Universities |
| المصدر: | IEEE Journal of the Electron Devices Society ; volume 8, page 485-489 ; ISSN 2168-6734 |
| بيانات النشر: | Institute of Electrical and Electronics Engineers (IEEE) |
| سنة النشر: | 2020 |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | unknown |
| DOI: | 10.1109/jeds.2020.2986172 |
| الاتاحة: | http://dx.doi.org/10.1109/jeds.2020.2986172 http://xplorestaging.ieee.org/ielx7/6245494/8949832/09060932.pdf?arnumber=9060932 |
| Rights: | https://creativecommons.org/licenses/by/4.0/legalcode |
| رقم الانضمام: | edsbas.3F513F7A |
| قاعدة البيانات: | BASE |
| DOI: | 10.1109/jeds.2020.2986172 |
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