Academic Journal
Erratum: Effect of thermal annealing treatments on the optical activation of Tb 3+ -doped amorphous SiC:H thin films (2016 J. Phys. D: Appl.49375104)
| العنوان: | Erratum: Effect of thermal annealing treatments on the optical activation of Tb 3+ -doped amorphous SiC:H thin films (2016 J. Phys. D: Appl.49375104) |
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| المؤلفون: | Guerra, J A, De Zela, F, Tucto, K, Montañez, L, Töfflinger, J A, Winnacker, A, Weingärtner, R |
| المصدر: | Journal of Physics D: Applied Physics ; volume 49, issue 40, page 409601 ; ISSN 0022-3727 1361-6463 |
| بيانات النشر: | IOP Publishing |
| سنة النشر: | 2016 |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | unknown |
| DOI: | 10.1088/0022-3727/49/40/409601 |
| الاتاحة: | http://dx.doi.org/10.1088/0022-3727/49/40/409601 http://stacks.iop.org/0022-3727/49/i=40/a=409601/pdf http://stacks.iop.org/0022-3727/49/i=40/a=409601?key=crossref.1a9eb39dc60b0187656b0ede2908fdf7 |
| Rights: | http://iopscience.iop.org/info/page/text-and-data-mining ; http://iopscience.iop.org/page/copyright |
| رقم الانضمام: | edsbas.3D19E48A |
| قاعدة البيانات: | BASE |
| DOI: | 10.1088/0022-3727/49/40/409601 |
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