Academic Journal

Subband electron properties of modulation-doped AlxGa1−xN/GaN heterostructures with different barrier thicknesses

التفاصيل البيبلوغرافية
العنوان: Subband electron properties of modulation-doped AlxGa1−xN/GaN heterostructures with different barrier thicknesses
المؤلفون: Jiang, C. P., Guo, S. L., Huang, Z. M., Yu, J., Gui, Y. S., Zheng, G. Z., Chu, J. H., Zheng, Z. W., Shen, B., Zheng, Y. D.
المصدر: Applied Physics Letters ; volume 79, issue 3, page 374-376 ; ISSN 0003-6951 1077-3118
بيانات النشر: AIP Publishing
سنة النشر: 2001
الوصف: Magnetotransport properties of modulation-doped Al0.22Ga0.78N/GaN heterostructures with different barrier thicknesses of 25–100 nm have been investigated in magnetic fields up to 9 T at 1.4 K. Fast Fourier transform has been applied to obtain the subband density and mobility of the two-dimensional electron gas in these heterostructures. High electron density of 1.18×1013 cm−2 and quantum mobility of ∼8200 cm2 V−1 s−1 are obtained when the barrier thickness is 75 nm, which indicates that there exists a critical barrier thickness between 50 and 100 nm in the modulation-doped Al0.22Ga0.78N/GaN heterostructures. We also find that the elastic strain relaxation of the barrier does not significantly enhance the quantum mobilities of the ground subbands, however, it has strong effect on the mobilities of the excited states. The experimental values obtained in this work are useful for the design and optimization AlxGa1−xN/GaN device.
نوع الوثيقة: article in journal/newspaper
اللغة: English
DOI: 10.1063/1.1386620
الاتاحة: http://dx.doi.org/10.1063/1.1386620
https://pubs.aip.org/aip/apl/article-pdf/79/3/374/18559084/374_1_online.pdf
رقم الانضمام: edsbas.38E19E4B
قاعدة البيانات: BASE