Academic Journal
Non-thermal plasma etching of MOF thin films in high optical quality for interference sensing
| العنوان: | Non-thermal plasma etching of MOF thin films in high optical quality for interference sensing |
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| المؤلفون: | Alekseevskiy, Pavel, Timofeeva, Maria, Bachinin, Semyon, Peignier, Regis, Noel, Cedric, Boulet, Pascal, Belmonte, Thierry, Milichko, Valentin |
| المساهمون: | ITMO University, St. Petersburg, Russia, Institut Jean Lamour (IJL), Institut de Chimie - CNRS Chimie (INC-CNRS)-Université de Lorraine (UL)-Centre National de la Recherche Scientifique (CNRS) |
| المصدر: | ISSN: 0925-3467. |
| بيانات النشر: | HAL CCSD Elsevier |
| سنة النشر: | 1482 |
| المجموعة: | Université de Lorraine: HAL |
| مصطلحات موضوعية: | Non-thermal plasma, Optical quality, Metal-organic framework, Thin film, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, [SPI.MAT]Engineering Sciences [physics]/Materials, [SPI.PLASMA]Engineering Sciences [physics]/Plasmas |
| الوصف: | International audience |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1016/j.optmat.2024.115666 |
| الاتاحة: | https://hal.univ-lorraine.fr/hal-04717875 https://hal.univ-lorraine.fr/hal-04717875v1/document https://hal.univ-lorraine.fr/hal-04717875v1/file/Paper%20for%20HAL.pdf https://doi.org/10.1016/j.optmat.2024.115666 |
| Rights: | http://creativecommons.org/licenses/by/ |
| رقم الانضمام: | edsbas.34A85F4D |
| قاعدة البيانات: | BASE |
| DOI: | 10.1016/j.optmat.2024.115666 |
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