Academic Journal
Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays
| العنوان: | Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays |
|---|---|
| المؤلفون: | Park, Woongkyu, Rhie, Jiyeah, Kim, Na Yeon, Hong, Seunghun, Kim, Dai-Sik |
| المصدر: | Scientific Reports ; volume 6, issue 1 ; ISSN 2045-2322 |
| بيانات النشر: | Springer Science and Business Media LLC |
| سنة النشر: | 2016 |
| الوصف: | Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 μm, and periodicity 100 μm on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate. |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1038/srep23823 |
| الاتاحة: | http://dx.doi.org/10.1038/srep23823 https://www.nature.com/articles/srep23823.pdf https://www.nature.com/articles/srep23823 |
| Rights: | https://creativecommons.org/licenses/by/4.0 ; https://creativecommons.org/licenses/by/4.0 |
| رقم الانضمام: | edsbas.32243875 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1038/srep23823 |
|---|