Academic Journal
Enhanced Corrosion Resistance of PVD-CrN Coatings by ALD Sealing Layers
العنوان: | Enhanced Corrosion Resistance of PVD-CrN Coatings by ALD Sealing Layers |
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المؤلفون: | Zhixin Wan, Teng Fei Zhang, Ji Cheng Ding, Chang-Min Kim, So-Won Park, Yang Yang, Kwang-Ho Kim, Se-Hun Kwon |
المصدر: | Nanoscale Research Letters, Vol 12, Iss 1, Pp 1-8 (2017) |
بيانات النشر: | SpringerOpen |
سنة النشر: | 2017 |
المجموعة: | Directory of Open Access Journals: DOAJ Articles |
مصطلحات موضوعية: | Multilayered hard coating, Hybrid deposition process, Sealing layer, PVD, ALD, Materials of engineering and construction. Mechanics of materials, TA401-492 |
الوصف: | Multilayered hard coatings with a CrN matrix and an Al2O3, TiO2, or nanolaminate-Al2O3/TiO2 sealing layer were designed by a hybrid deposition process combined with physical vapor deposition (PVD) and atomic layer deposition (ALD). The strategy was to utilize ALD thin films as pinhole-free barriers to seal the intrinsic defects to protect the CrN matrix. The influences of the different sealing layers added in the coatings on the microstructure, surface roughness, and corrosion behaviors were investigated. The results indicated that the sealing layer added by ALD significantly decreased the average grain size and improved the corrosion resistance of the CrN coatings. The insertion of the nanolaminate-Al2O3/TiO2 sealing layers resulted in a further increase in corrosion resistance, which was attributed to the synergistic effect of Al2O3 and TiO2, both acting as excellent passivation barriers to the diffusion of corrosive substances. |
نوع الوثيقة: | article in journal/newspaper |
اللغة: | English |
تدمد: | 1931-7573 1556-276X |
Relation: | http://link.springer.com/article/10.1186/s11671-017-2020-1; https://doaj.org/toc/1931-7573; https://doaj.org/toc/1556-276X; https://doaj.org/article/25c4adb38166461d9f91da47a4e13177 |
DOI: | 10.1186/s11671-017-2020-1 |
الاتاحة: | https://doi.org/10.1186/s11671-017-2020-1 https://doaj.org/article/25c4adb38166461d9f91da47a4e13177 |
رقم الانضمام: | edsbas.1B21ABAF |
قاعدة البيانات: | BASE |
تدمد: | 19317573 1556276X |
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DOI: | 10.1186/s11671-017-2020-1 |