Academic Journal
New Copolymers of Dialkyl Fumarates with Norbornene Derivatives for Sub-0.2 µm Lithography at a Wavelength of 193 nm: Synthesis and Thermal and Photochemical Transformations
| العنوان: | New Copolymers of Dialkyl Fumarates with Norbornene Derivatives for Sub-0.2 µm Lithography at a Wavelength of 193 nm: Synthesis and Thermal and Photochemical Transformations |
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| المؤلفون: | Vainer, A. Ya., Dyumaev, K. M., Eremina, L. A., Tamarkina, R. V., Ternovskii, E. P., Shvartsburg, L. M. |
| المصدر: | Doklady Physical Chemistry ; volume 404, issue 1-3, page 159-161 ; ISSN 0012-5016 1608-3121 |
| بيانات النشر: | Springer Science and Business Media LLC |
| سنة النشر: | 2005 |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| DOI: | 10.1007/s10634-005-0049-9 |
| DOI: | 10.1007/s10634-005-0049-9.pdf |
| DOI: | 10.1007/s10634-005-0049-9/fulltext.html |
| الاتاحة: | http://dx.doi.org/10.1007/s10634-005-0049-9 http://link.springer.com/content/pdf/10.1007/s10634-005-0049-9.pdf http://link.springer.com/article/10.1007/s10634-005-0049-9/fulltext.html http://link.springer.com/content/pdf/10.1007/s10634-005-0049-9 |
| Rights: | http://www.springer.com/tdm |
| رقم الانضمام: | edsbas.14301587 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1007/s10634-005-0049-9 |
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