Conference
A new optimization strategy for CMOS device process in the era of 0.2 μm and beyond for MPU's and ASIC's
| العنوان: | A new optimization strategy for CMOS device process in the era of 0.2 μm and beyond for MPU's and ASIC's |
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| المؤلفون: | Mori, K., Kikushima, K., Ootsuka, F., Mitani, S. |
| المصدر: | Proceedings of the IEEE 1998 Custom Integrated Circuits Conference (Cat. No.98CH36143) ; page 155-158 |
| بيانات النشر: | IEEE |
| سنة النشر: | 2002 |
| نوع الوثيقة: | conference object |
| اللغة: | unknown |
| DOI: | 10.1109/cicc.1998.694926 |
| الاتاحة: | http://dx.doi.org/10.1109/cicc.1998.694926 http://xplorestaging.ieee.org/ielx4/5666/15173/00694926.pdf?arnumber=694926 |
| رقم الانضمام: | edsbas.10616DF7 |
| قاعدة البيانات: | BASE |
| DOI: | 10.1109/cicc.1998.694926 |
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