Report
Free-standing silicon shadow masks for transmon qubit fabrication
| العنوان: | Free-standing silicon shadow masks for transmon qubit fabrication |
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| المؤلفون: | Tsioutsios, I., Serniak, K., Diamond, S., Sivak, V. V., Wang, Z., Shankar, S., Frunzio, L., Schoelkopf, R. J., Devoret, M. H. |
| المصدر: | AIP Advances 10, 065120 (2020) |
| سنة النشر: | 2019 |
| المجموعة: | Physics (Other) Quantum Physics |
| مصطلحات موضوعية: | Physics - Applied Physics, Quantum Physics |
| الوصف: | Nanofabrication techniques for superconducting qubits rely on resist-based masks patterned by electron-beam or optical lithography. We have developed an alternative nanofabrication technique based on free-standing silicon shadow masks fabricated from silicon-on-insulator wafers. These silicon shadow masks not only eliminate organic residues associated with resist-based lithography, but also provide a pathway to better understand and control surface-dielectric losses in superconducting qubits by decoupling mask fabrication from substrate preparation. We have successfully fabricated aluminum 3D transmon superconducting qubits with these shadow masks and found coherence quality factors comparable to those fabricated with standard techniques. Comment: 6 pages, 6 figures, additional experimental data - new figure, typos corrected, supplementary material (2 pages, 1 figure, 1 table) |
| نوع الوثيقة: | Working Paper |
| DOI: | 10.1063/1.5138953 |
| URL الوصول: | http://arxiv.org/abs/1911.05924 |
| رقم الانضمام: | edsarx.1911.05924 |
| قاعدة البيانات: | arXiv |
| DOI: | 10.1063/1.5138953 |
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