Induced spin-orbit coupling in silicon thin films by bismuth doping

التفاصيل البيبلوغرافية
العنوان: Induced spin-orbit coupling in silicon thin films by bismuth doping
المؤلفون: Rortais, F., Lee, S., Ohshima, R., Dushenko, S., Ando, Y., Shiraishi, M.
المصدر: Appl. Phys. Lett. 113, 122408 (2018)
سنة النشر: 2018
المجموعة: Condensed Matter
مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics, Condensed Matter - Materials Science
الوصف: We demonstrate an enhancement of the spin-orbit coupling in silicon (Si) thin films by doping with bismuth (Bi), a heavy metal, using ion implantation. Quantum corrections to conductance at low temperature in phosphorous-doped Si before and after Bi implantation is measured to probe the increase of the spin-orbit coupling, and a clear modification of magnetoconductance signals is observed: Bi doping changes magnetoconductance from weak localization to the crossover between weak localization and weak antilocalization. The elastic diffusion length, phase coherence length and spin-orbit coupling length in Si with and without Bi implantation are estimated, and the spin-orbit coupling length after the Bi doping becomes the same order of magnitude (Lso = 54 nm) with the phase coherence length (L{\phi} = 35 nm) at 2 K. This is an experimental proof that the spin-orbit coupling strength in Si thin film is tunable by doping with heavy metals.
Comment: 13 pages, 3 figures
نوع الوثيقة: Working Paper
DOI: 10.1063/1.5046781
URL الوصول: http://arxiv.org/abs/1810.06878
رقم الانضمام: edsarx.1810.06878
قاعدة البيانات: arXiv